Polovodiče

Bow and warp of wafers

Confocal chromatic sensors scan the wafer surface to detect bow, warp and distortion. Providing a measuring rate of 70 kHz, confocalDT controllers enable highly dynamic measurements, allowing the wafer ...

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Detection and measurement of saw marks

For automatic detection and measurement of saw marks, confocal chromatic sensors from Micro-Epsilon are used. The fast surface compensation feature of the controller regulates the exposure cycles in order ...

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Recognition and measurement of bumps on silicon wafers

Confocal chromatic displacement sensors from Micro-Epsilon are used to inspect bumps. They generate a small light spot onto the wafer, while reliably detecting the smallest of parts and structures at high ...

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Transparent layers & adhesive beading

Confocal chromatic sensors are used for one-sided layer thickness measurements. The confocal measuring principle enables the evaluation of several signal peaks, allowing the thickness of transparent materials ...

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Wafer thickness measurement / TTV

Confocal chromatic sensors measure the thickness deviation (Total Thickness Variation) and the wafer thickness from both sides. Based on the wafer thickness profile, bow and warp of the wafer can be detected. ...

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Inspection of cracks and breakages

Confocal chromatic sensors from Micro-Epsilon are used to detect cracks and other defects on the wafer. They reliably detect surfaces with varying reflection characteristics due to a fast surface compensation ...

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Positioning of the lens system in lithography machines

Non-contact, inductive displacement sensors (eddy current) measure the position of lens elements in order to achieve the highest possible imaging accuracy. Depending on the lens system, displacement sensors ...

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Positioning the wafer stage

Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive ...

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Nanometrické polohování na litografických strojích

Pro osvětlení jednotlivých komponent na plátku se litografická zařízení pohybují plátkem do příslušné polohy. Kapacitní ...

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Umístění masky v litografii

Litografické procesy vyžadují vysoké rozlišení a dlouhodobé měření pohybu strojů, aby bylo dosaženo maximální přesnosti. Vysoké ...

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Vysoce přesné měření tloušťky křemíkových destiček

Pro přesné měření tloušťky destiček se používají kapacitní snímače. Dva protilehlé snímače detekují tloušťku a také ...

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MICRO-EPSILON Czech Republic
Na Libuši 891
39165 Bechyně, Czech Republic
info@micro-epsilon.cz
+420 381 213 011
+420 381 211 060